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Electron beam lithography (EBL) and laser beam lithography (LBL) systems - Razpisi EU
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Electron beam lithography (EBL) and laser beam lithography (LBL) systems

Pregled
  • Uverejnené
    09/04/2025
  • Rok
    12/05/2025
  • Odpiranje ponudb
    13/05/2025
  • Oddano
    12/06/2025
  • Danes
    21/02/2026
Status
Oddano
Vrsta naročila
Supplies
Predmet podaljšanja
No
Kupec
University of Jyväskylä
Kraj izvajanja
NUTS code: Več krajev izvedbe
Naslov kupca
NUTS code: FI193 Keski-Suomi
Gospodarska panoga (glavna CPV)
38000000 Laboratorijska, optična in precizna oprema (razen očal)
Skupna ocenjena vrednost naročila (brez DDV)
Ni na voljo
Skupna končna vrednost naročila (brez DDV)
Ni na voljo
Število sklopov
2
Podrobnosti o postopku
Referenčna številka ponudbe
49/02.03.00.00/2025
Opis

University of Jyväskylä (JYU) is inviting tenders for a combination of an electron beam lithography system (EBL) and a laser beam lithography system (LBL), both capable of mix-and-match processing based on CAD drawings in GDSII file format. We are searching a Dedicated EBL tool AND a Dedicated LBL tool for research and development of state of the art micro- and nano-scale features requiring high fidelity in patterning and edge smoothness. Contracting authority has a need for high precision and versatile lithography tools for patterning of optical wave guides and lattices, phononic crystals and mechanic resonators; with the goal of investigating quantum phenomena and the interplay between such structures. Contracting authority has a need for the lithography tools to support integration of high fidelity nano-scale features into considerably larger designs, such as microfluidic networks with widths of about 100 um and lengths of several mm. Therefore, contracting authority puts emphasis on the two lithography systems having good support for mix-and-match lithography, i.e. well documented procedures for sharing CAD pattern libraries for straightforward implementation in mix-and-match exposures on the same resist layer. The EBL and LBL systems should manage mix-and-match exposures with resists such as Shipley S1813, SU-8 and AZ5200-E series.

Način oddaje
Po elektronski pošti:
https://tarjouspalvelu.fi/jyu?id=554652&tpk=f5818810-6526-450c-9dc2-46e72a8a5aec
Ponudbo je zdaj mogoče oddati.
Elektronska predložitev: zahtevana
https://tarjouspalvelu.fi/jyu?id=554652&tpk=f5818810-6526-450c-9dc2-46e72a8a5aec
Podatki o javnem naročilu, okvirnem sporazumu ali dinamičnem nabavnem sistemu
Ni na voljo
Pogoji za odpiranje ponudb (datum)
13/05/2025 09:00
Kraj izvajanja
FI193 Keski-Suomi
FI Suomi/Finland
Any country
oznaka CPV

38000000 - Laboratorijska, optična in precizna oprema (razen očal)

Sklopi (2)
Dokumenti
Predhodna informacija
Naročilo
Dodelitev
Footnote - legal notice

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