Acquisition of atomic layer deposition (ALD) equipment for aluminium oxide, titanium oxide and hafnium oxide Text automatically translated in your browsing language Automatically translated

The current capacity to deposit dielectric materials at the NTC institute at micro/nanometric scale and wafer level is limited to chemical vapour deposition (CVD) techniques. Plasma-enhanced chemical vapour tank equipment is available which offers amorphous dielectric thin films. The ALD process consists of the growth of a thin film by consecutive atomic layers. The fact of having an ALD equipment that in addition to increasing the manufacturing capacity, will offer uniformity and conformity of the film on any scale and would have a clear impact on the quality of the research carried out as well as on the capacities offered by the NTC Institute would be very high. ALD is the most advanced thin film coating technique due to the precise film thickness control (nm) it offers. The films produced by this technique are dense, pore-free and flawless, and the conditions under which the process is carried out, 1-10 hPa 200-400oC, are soft enough to be used with sensitive substrates. This type of process is also essential when working with external customers and supplying quality controls and technical specifications of the manufactured devices. As the semiconductor industry continues to evolve, the ever-thinning size of devices makes it especially important to find or develop more advanced thin film growth techniques that require low temperature, high film thickness accuracy, and excellent conformability in three-dimensional (3D) structures. Therefore, this center lacks the necessary equipment to ensure quality and compliance with specifications at the nanometric level during the manufacturing process. To fill these gaps, the purchase of a multi-oxide atomic layer deposition equipment is requested. Text automatically translated in your browsing language Automatically translated

31712100 - Microelectronic machinery and apparatus

38000000 - Laboratory, optical and precision equipments (excl. glasses) CVP code deduced from the text of the procedure AI-generated